Thermal stability of ALD HfO2 thin films and interfacial layers on the oxynitride underlayer formed using remote plasma

Seokhoon Kim, Ju Youn Kim, Jinwoo Kim, Jihoon Choi, Hyunseok Kang, Choelhwyi Bae, Hyeongtag Jeon

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Small amounts of N atoms were successfully incorporated by remote nitrogen plasma treatment into an oxynitride underlayer for the growth of an atomic layer deposited (ALD) HfO2 thin film. As the electron density and emission intensity of nitrogen plasma increased with plasma power, the concentration of incorporated N atoms increased. The dominant emission species in the N 2 plasma were excited atomic nitrogen (N*) and excited molecular nitrogen (N2 *). Due to the oxynitride layer, the growth of the interfacial layer in HfO2 films was effectively suppressed, the crystallization temperature of HfO2 films increased, and the electrical properties were improved.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume9
Issue number2
DOIs
StatePublished - 2006 Apr 10

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Nitrogen plasma
oxynitrides
Thermodynamic stability
thermal stability
Nitrogen
nitrogen plasma
Plasmas
Thin films
Atoms
Electron emission
thin films
Crystallization
Carrier concentration
nitrogen
Electric properties
electron emission
atoms
electrical properties
crystallization
Temperature

Cite this

Kim, Seokhoon ; Kim, Ju Youn ; Kim, Jinwoo ; Choi, Jihoon ; Kang, Hyunseok ; Bae, Choelhwyi ; Jeon, Hyeongtag. / Thermal stability of ALD HfO2 thin films and interfacial layers on the oxynitride underlayer formed using remote plasma. In: Electrochemical and Solid-State Letters. 2006 ; Vol. 9, No. 2.
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Thermal stability of ALD HfO2 thin films and interfacial layers on the oxynitride underlayer formed using remote plasma. / Kim, Seokhoon; Kim, Ju Youn; Kim, Jinwoo; Choi, Jihoon; Kang, Hyunseok; Bae, Choelhwyi; Jeon, Hyeongtag.

In: Electrochemical and Solid-State Letters, Vol. 9, No. 2, 10.04.2006.

Research output: Contribution to journalArticle

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AU - Kim, Seokhoon

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AU - Choi, Jihoon

AU - Kang, Hyunseok

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AU - Jeon, Hyeongtag

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