Thermal behavior of alkyl monolayers on silicon surfaces

Myung Mo Sung, G. Jonathan Kluth, Oranna W. Yauw, Roya Maboudian

Research output: Contribution to journalArticle

216 Citations (Scopus)

Abstract

Densely-packed alkyl monolayers similar to those previously reported by Linford et al.1,2 are formed by the reaction of 1-alkenes with hydrogen-terminated surfaces of both Si(111) and Si(100). The thermal behavior of these monolayers in vacuum has been studied using high-resolution electron energy loss spectroscopy. Both on Si(111) and on Si(100), the monolayers are found to be stable up to about 615 K. Desorption is signaled by a decrease in the intensity of C-H modes, accompanied by the appearance of Si-H modes, which suggests that desorption occurs through β-hydride elimination reactions. Upon further annealing to 785 K, C-H and Si-H modes essentially disappear, and a peak appears at 780 cm-1, which is attributed to a SiC vibrational mode. This behavior indicates that decomposition of the monolayers has taken place.

Original languageEnglish
Pages (from-to)6164-6167
Number of pages4
JournalLangmuir
Volume13
Issue number23
StatePublished - 1997 Nov 12

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Silicon
Monolayers
silicon
desorption
Desorption
alkenes
hydrides
Electron energy loss spectroscopy
elimination
vibration mode
Alkenes
energy dissipation
Hydrides
electron energy
Olefins
decomposition
Hydrogen
vacuum
annealing
high resolution

Cite this

Sung, M. M., Kluth, G. J., Yauw, O. W., & Maboudian, R. (1997). Thermal behavior of alkyl monolayers on silicon surfaces. Langmuir, 13(23), 6164-6167.
Sung, Myung Mo ; Kluth, G. Jonathan ; Yauw, Oranna W. ; Maboudian, Roya. / Thermal behavior of alkyl monolayers on silicon surfaces. In: Langmuir. 1997 ; Vol. 13, No. 23. pp. 6164-6167.
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Sung, MM, Kluth, GJ, Yauw, OW & Maboudian, R 1997, 'Thermal behavior of alkyl monolayers on silicon surfaces', Langmuir, vol. 13, no. 23, pp. 6164-6167.

Thermal behavior of alkyl monolayers on silicon surfaces. / Sung, Myung Mo; Kluth, G. Jonathan; Yauw, Oranna W.; Maboudian, Roya.

In: Langmuir, Vol. 13, No. 23, 12.11.1997, p. 6164-6167.

Research output: Contribution to journalArticle

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AB - Densely-packed alkyl monolayers similar to those previously reported by Linford et al.1,2 are formed by the reaction of 1-alkenes with hydrogen-terminated surfaces of both Si(111) and Si(100). The thermal behavior of these monolayers in vacuum has been studied using high-resolution electron energy loss spectroscopy. Both on Si(111) and on Si(100), the monolayers are found to be stable up to about 615 K. Desorption is signaled by a decrease in the intensity of C-H modes, accompanied by the appearance of Si-H modes, which suggests that desorption occurs through β-hydride elimination reactions. Upon further annealing to 785 K, C-H and Si-H modes essentially disappear, and a peak appears at 780 cm-1, which is attributed to a SiC vibrational mode. This behavior indicates that decomposition of the monolayers has taken place.

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Sung MM, Kluth GJ, Yauw OW, Maboudian R. Thermal behavior of alkyl monolayers on silicon surfaces. Langmuir. 1997 Nov 12;13(23):6164-6167.