Studies of surface resistance of copper(II) phthalocyanine thin films by using a near-field scanning microwave microscope

Miehwa Park, Hyunjun Yoo, Sunil Yun, Eunju Lim, Kiejin Lee, Chang Hwan Chang, Man Kil Joo, Ik Jae Lee, Jae-yong Kim, Barry Friedman

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We observed the surface resistance of copper(II) phthalocyanine (Cu-Pc) thin films dependence on substrate heating temperature by using a near-field scanning microwave microscope (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f=4.5-5.5GHz. The crystal structures and surface resistance of Cu-Pc thin films due to different heating temperatures were observed by using X-ray diffraction including the 2θ and φ-scan and the near-field scanning microwave microscope. As the temperatures increased from room temperature to 200°C, the crystal structure of Cu-Pc thin films was transformed from monoclinic α-Phase to thermally stable monoclinic β-Phase. The changes in surface resistance of Cu-Pc thin films due to different substrate heating temperatures were investigated by NSMM by measuring the reflection coefficient S 11 . The surface resistance of Cu-Pc thin films depends on the morphology and crystal alignment of these films. When the substrate temperature for deposition was 150°C, the minimum surface resistance of Cu-Pc thin films was obtained.

Original languageEnglish
Pages (from-to)213-218
Number of pages6
JournalApplied Surface Science
Volume233
Issue number1-4
DOIs
StatePublished - 2004 Jun 30

Fingerprint

Surface resistance
Copper
Microscopes
Microwaves
Scanning
Thin films
Heating
Temperature
Substrates
Crystal structure
Dielectric resonators
phthalocyanine
X ray diffraction
Crystals

Keywords

  • Copper(II) phthalocyanine
  • Near-field scanning microwave microscope
  • Surface resistance
  • α-Phase
  • β-Phase

Cite this

Park, Miehwa ; Yoo, Hyunjun ; Yun, Sunil ; Lim, Eunju ; Lee, Kiejin ; Chang, Chang Hwan ; Joo, Man Kil ; Lee, Ik Jae ; Kim, Jae-yong ; Friedman, Barry. / Studies of surface resistance of copper(II) phthalocyanine thin films by using a near-field scanning microwave microscope. In: Applied Surface Science. 2004 ; Vol. 233, No. 1-4. pp. 213-218.
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abstract = "We observed the surface resistance of copper(II) phthalocyanine (Cu-Pc) thin films dependence on substrate heating temperature by using a near-field scanning microwave microscope (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f=4.5-5.5GHz. The crystal structures and surface resistance of Cu-Pc thin films due to different heating temperatures were observed by using X-ray diffraction including the 2θ and φ-scan and the near-field scanning microwave microscope. As the temperatures increased from room temperature to 200°C, the crystal structure of Cu-Pc thin films was transformed from monoclinic α-Phase to thermally stable monoclinic β-Phase. The changes in surface resistance of Cu-Pc thin films due to different substrate heating temperatures were investigated by NSMM by measuring the reflection coefficient S 11 . The surface resistance of Cu-Pc thin films depends on the morphology and crystal alignment of these films. When the substrate temperature for deposition was 150°C, the minimum surface resistance of Cu-Pc thin films was obtained.",
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Studies of surface resistance of copper(II) phthalocyanine thin films by using a near-field scanning microwave microscope. / Park, Miehwa; Yoo, Hyunjun; Yun, Sunil; Lim, Eunju; Lee, Kiejin; Chang, Chang Hwan; Joo, Man Kil; Lee, Ik Jae; Kim, Jae-yong; Friedman, Barry.

In: Applied Surface Science, Vol. 233, No. 1-4, 30.06.2004, p. 213-218.

Research output: Contribution to journalArticle

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AB - We observed the surface resistance of copper(II) phthalocyanine (Cu-Pc) thin films dependence on substrate heating temperature by using a near-field scanning microwave microscope (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f=4.5-5.5GHz. The crystal structures and surface resistance of Cu-Pc thin films due to different heating temperatures were observed by using X-ray diffraction including the 2θ and φ-scan and the near-field scanning microwave microscope. As the temperatures increased from room temperature to 200°C, the crystal structure of Cu-Pc thin films was transformed from monoclinic α-Phase to thermally stable monoclinic β-Phase. The changes in surface resistance of Cu-Pc thin films due to different substrate heating temperatures were investigated by NSMM by measuring the reflection coefficient S 11 . The surface resistance of Cu-Pc thin films depends on the morphology and crystal alignment of these films. When the substrate temperature for deposition was 150°C, the minimum surface resistance of Cu-Pc thin films was obtained.

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