Specific immobilization of nanospheres on template fabricated by using atomic force microscope lithography

Jinyoung Park, Haiwon Lee

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The atomic force microscope (AFM) lithography was locally applied to the methyl group-modified substrate and selective immobilization of polystyrene (PS) nanospheres onto an anchored self-assembled monolayer was successfully carried out. In order to immobilize PS nanospheres on the rigid surface selectively, the patterned area was further modified with amine group by self-assembly process. The PS nanospheres modified with carboxylic acid group were selectively immobilized by the covalent bond onto the amine-modified area. The immobilized polystyrene nanospheres were characterized by a tapping mode AFM and ellipsometry.

Original languageEnglish
Pages (from-to)133-135
Number of pages3
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume257-258
DOIs
StatePublished - 2005 May 5

Fingerprint

Nanospheres
Polystyrenes
immobilization
Lithography
polystyrene
Microscopes
templates
lithography
microscopes
Amines
amines
Covalent bonds
Ellipsometry
covalent bonds
Self assembled monolayers
Carboxylic Acids
Carboxylic acids
carboxylic acids
Self assembly
ellipsometry

Keywords

  • AFM lithography
  • Covalent bond
  • Nanosphere
  • Selective immobilization

Cite this

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abstract = "The atomic force microscope (AFM) lithography was locally applied to the methyl group-modified substrate and selective immobilization of polystyrene (PS) nanospheres onto an anchored self-assembled monolayer was successfully carried out. In order to immobilize PS nanospheres on the rigid surface selectively, the patterned area was further modified with amine group by self-assembly process. The PS nanospheres modified with carboxylic acid group were selectively immobilized by the covalent bond onto the amine-modified area. The immobilized polystyrene nanospheres were characterized by a tapping mode AFM and ellipsometry.",
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AU - Lee, Haiwon

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AB - The atomic force microscope (AFM) lithography was locally applied to the methyl group-modified substrate and selective immobilization of polystyrene (PS) nanospheres onto an anchored self-assembled monolayer was successfully carried out. In order to immobilize PS nanospheres on the rigid surface selectively, the patterned area was further modified with amine group by self-assembly process. The PS nanospheres modified with carboxylic acid group were selectively immobilized by the covalent bond onto the amine-modified area. The immobilized polystyrene nanospheres were characterized by a tapping mode AFM and ellipsometry.

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KW - Nanosphere

KW - Selective immobilization

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JO - Colloids and Surfaces A: Physicochemical and Engineering Aspects

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