A floating type Langmuir probe was studied to measure the electron energy distribution function (EEDF) in plasmas. This method measures the current (I)-voltage (V) curve with rising and falling variations based on a floating potential by using charge-discharge characteristics of the series capacitor when a square-pulse voltage is applied. In addition, this method measures the EEDF by using the alternating current (ac) superposition method. The measured EEDFs were in good agreement with results from a conventional single Langmuir probe. This technique could be applied as a plasma diagnostic method in the capacitively coupled plasma where the plasma potential is extremely high or the processing plasma where the deposition gas is used.