Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiN xFilms Using Trichlorodisilane for Etch-Resistant Coatings

Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, Arul Vigneswar Ravichandran, Akshay Sahota, Jaebeom Lee, Yong Chan Jung, Si Joon Kim, Jinho Ahn, Byung Keun Hwang, Lance Lee, Xiaobing Zhou, Jiyoung Kim

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