Nondestructive and destructive characterization of nano-structured multilayer

Tae Geun Kim, Seung Yoon Lee, In Yong Kang, Yong Chae Chung, Jinho Ahn

Research output: Contribution to journalConference articlepeer-review

Abstract

EUV is the last region of the electromagnetic spectrum to be developed, and reflection is one best way to manipulate this wave which is mostly absorbed by all materials. Reflectivity of this multilayer is very important for energy efficiency, and is known to be closely related to the structure factor (e.g., thicknesses of nano-scale mutilayers, their ratio, and the number of stacking periods). The destructive and non-destructive analysises (cross-sectional transmission electron microscopy and x-ray diffractometry, respectively) were performed to evaluate the 80-layered multilayer, but the results do not match each other nor agree with theoretical expectation. Non-ideal factors which cannot be easily detected are the main sources of error, and those are speculated to be inter-diffusion at the interface, roughness, film density variation, and surface oxidation. These non-ideal factors can be included during low angle x-ray diffraction, and this is why x-ray diffraction gives the better evaluation of EUV optical properties.

Original languageEnglish
Pages (from-to)849-854
Number of pages6
JournalKey Engineering Materials
Volume270-273
Issue numberI
StatePublished - 2004
EventProceedings of the 11th Asian Pacific Conference on Nondestructive Testing - Jeju Island, Korea, Republic of
Duration: 2003 Nov 32003 Nov 7

Keywords

  • EUVL
  • Mo/Si
  • Multilayer
  • Reflectivity
  • TEM
  • XRD

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