Local acceleration effects of adatom at the vicinity on the surface: Case of Co nano thin-films on Al surface

Sang Pil Kim, Seung Cheol Lee, Kwang Ryeol Lee, Yong-Chae Chung

Research output: Contribution to journalArticle

Abstract

The local acceleration effects, which are peculiar phenomena during atomic scale deposition process, were investigated by Molecular Dynamics (MD) simulation. The values of local acceleration were distributed widely for various surface orientations. Deposited atoms were accelerated along the potential energy surface, and accelerated values were evidently dependent on the local configuration of the surface. In contrast, the local acceleration became negligibly small for clusters consisting of many atoms.

Original languageEnglish
Pages (from-to)581-584
Number of pages4
JournalKey Engineering Materials
Volume317-318
StatePublished - 2006 Jul 24

Fingerprint

Adatoms
Thin films
Atoms
Potential energy surfaces
Molecular dynamics
Computer simulation

Keywords

  • Co/Al Multilayer
  • Intermixing
  • Local Acceleration
  • Molecular Dynamics simulation

Cite this

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abstract = "The local acceleration effects, which are peculiar phenomena during atomic scale deposition process, were investigated by Molecular Dynamics (MD) simulation. The values of local acceleration were distributed widely for various surface orientations. Deposited atoms were accelerated along the potential energy surface, and accelerated values were evidently dependent on the local configuration of the surface. In contrast, the local acceleration became negligibly small for clusters consisting of many atoms.",
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Local acceleration effects of adatom at the vicinity on the surface : Case of Co nano thin-films on Al surface. / Kim, Sang Pil; Lee, Seung Cheol; Lee, Kwang Ryeol; Chung, Yong-Chae.

In: Key Engineering Materials, Vol. 317-318, 24.07.2006, p. 581-584.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Local acceleration effects of adatom at the vicinity on the surface

T2 - Case of Co nano thin-films on Al surface

AU - Kim, Sang Pil

AU - Lee, Seung Cheol

AU - Lee, Kwang Ryeol

AU - Chung, Yong-Chae

PY - 2006/7/24

Y1 - 2006/7/24

N2 - The local acceleration effects, which are peculiar phenomena during atomic scale deposition process, were investigated by Molecular Dynamics (MD) simulation. The values of local acceleration were distributed widely for various surface orientations. Deposited atoms were accelerated along the potential energy surface, and accelerated values were evidently dependent on the local configuration of the surface. In contrast, the local acceleration became negligibly small for clusters consisting of many atoms.

AB - The local acceleration effects, which are peculiar phenomena during atomic scale deposition process, were investigated by Molecular Dynamics (MD) simulation. The values of local acceleration were distributed widely for various surface orientations. Deposited atoms were accelerated along the potential energy surface, and accelerated values were evidently dependent on the local configuration of the surface. In contrast, the local acceleration became negligibly small for clusters consisting of many atoms.

KW - Co/Al Multilayer

KW - Intermixing

KW - Local Acceleration

KW - Molecular Dynamics simulation

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