Impurity reduction in a plasma by using the deuterium and helium glow discharge method

Sangyong Lee, Jaeyong Kim

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

To reduce the levels of impurities such as water, oxygen and nitrogen in a plasma chamber, we evaporated and deposited carborane (C2B10H12) powders on a silicon substrate by using a glow discharge method, and investigated the effects of boronization as functions of the carborane temperature and the rates of the flowing gases between deuterium and helium. The reduced amount of impurities after boronization was estimated by measuring the partial pressures of the corresponding gases in the chamber and the concentrations of nitrogen and oxygen in a deposited carborane film. The ratio of deuterium to hydrogen in the deposited film was analyzed by using secondary ion mass spectrometry (SIMS). When carborane powders were evaporated under a deuterium atmosphere, the residual gas analyzer showed a significant decrease in the partial pressure of water while less change was noted from the partial pressures of nitrogen and oxygen. The most efficient removal rate for water was obtained when carborane powder was flown under deuterium atmosphere at 150 °C. The SIMS data showed higher concentrations of nitrogen and oxygen in the carborane films deposited on Si substrates under a deuterium atmosphere, demonstrating that boronization under a deuterium atmosphere is an effective method to remove impurities.

Original languageEnglish
Pages (from-to)465-469
Number of pages5
JournalJournal of the Korean Physical Society
Volume66
Issue number3
DOIs
StatePublished - 2015 Jan 1

Fingerprint

carborane
glow discharges
deuterium
helium
impurities
partial pressure
nitrogen
atmospheres
oxygen
secondary ion mass spectrometry
chambers
water
residual gas
gases
analyzers
silicon
hydrogen

Keywords

  • Boronization
  • Carborane(CBH)
  • Deuterium
  • Plasma Glow Discharge

Cite this

@article{9040e4126fda49ccb95022b7a838d9b0,
title = "Impurity reduction in a plasma by using the deuterium and helium glow discharge method",
abstract = "To reduce the levels of impurities such as water, oxygen and nitrogen in a plasma chamber, we evaporated and deposited carborane (C2B10H12) powders on a silicon substrate by using a glow discharge method, and investigated the effects of boronization as functions of the carborane temperature and the rates of the flowing gases between deuterium and helium. The reduced amount of impurities after boronization was estimated by measuring the partial pressures of the corresponding gases in the chamber and the concentrations of nitrogen and oxygen in a deposited carborane film. The ratio of deuterium to hydrogen in the deposited film was analyzed by using secondary ion mass spectrometry (SIMS). When carborane powders were evaporated under a deuterium atmosphere, the residual gas analyzer showed a significant decrease in the partial pressure of water while less change was noted from the partial pressures of nitrogen and oxygen. The most efficient removal rate for water was obtained when carborane powder was flown under deuterium atmosphere at 150 °C. The SIMS data showed higher concentrations of nitrogen and oxygen in the carborane films deposited on Si substrates under a deuterium atmosphere, demonstrating that boronization under a deuterium atmosphere is an effective method to remove impurities.",
keywords = "Boronization, Carborane(CBH), Deuterium, Plasma Glow Discharge",
author = "Sangyong Lee and Jaeyong Kim",
year = "2015",
month = "1",
day = "1",
doi = "10.3938/jkps.66.465",
language = "English",
volume = "66",
pages = "465--469",
journal = "Journal of the Korean Physical Society",
issn = "0374-4884",
number = "3",

}

Impurity reduction in a plasma by using the deuterium and helium glow discharge method. / Lee, Sangyong; Kim, Jaeyong.

In: Journal of the Korean Physical Society, Vol. 66, No. 3, 01.01.2015, p. 465-469.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Impurity reduction in a plasma by using the deuterium and helium glow discharge method

AU - Lee, Sangyong

AU - Kim, Jaeyong

PY - 2015/1/1

Y1 - 2015/1/1

N2 - To reduce the levels of impurities such as water, oxygen and nitrogen in a plasma chamber, we evaporated and deposited carborane (C2B10H12) powders on a silicon substrate by using a glow discharge method, and investigated the effects of boronization as functions of the carborane temperature and the rates of the flowing gases between deuterium and helium. The reduced amount of impurities after boronization was estimated by measuring the partial pressures of the corresponding gases in the chamber and the concentrations of nitrogen and oxygen in a deposited carborane film. The ratio of deuterium to hydrogen in the deposited film was analyzed by using secondary ion mass spectrometry (SIMS). When carborane powders were evaporated under a deuterium atmosphere, the residual gas analyzer showed a significant decrease in the partial pressure of water while less change was noted from the partial pressures of nitrogen and oxygen. The most efficient removal rate for water was obtained when carborane powder was flown under deuterium atmosphere at 150 °C. The SIMS data showed higher concentrations of nitrogen and oxygen in the carborane films deposited on Si substrates under a deuterium atmosphere, demonstrating that boronization under a deuterium atmosphere is an effective method to remove impurities.

AB - To reduce the levels of impurities such as water, oxygen and nitrogen in a plasma chamber, we evaporated and deposited carborane (C2B10H12) powders on a silicon substrate by using a glow discharge method, and investigated the effects of boronization as functions of the carborane temperature and the rates of the flowing gases between deuterium and helium. The reduced amount of impurities after boronization was estimated by measuring the partial pressures of the corresponding gases in the chamber and the concentrations of nitrogen and oxygen in a deposited carborane film. The ratio of deuterium to hydrogen in the deposited film was analyzed by using secondary ion mass spectrometry (SIMS). When carborane powders were evaporated under a deuterium atmosphere, the residual gas analyzer showed a significant decrease in the partial pressure of water while less change was noted from the partial pressures of nitrogen and oxygen. The most efficient removal rate for water was obtained when carborane powder was flown under deuterium atmosphere at 150 °C. The SIMS data showed higher concentrations of nitrogen and oxygen in the carborane films deposited on Si substrates under a deuterium atmosphere, demonstrating that boronization under a deuterium atmosphere is an effective method to remove impurities.

KW - Boronization

KW - Carborane(CBH)

KW - Deuterium

KW - Plasma Glow Discharge

UR - http://www.scopus.com/inward/record.url?scp=84923821836&partnerID=8YFLogxK

U2 - 10.3938/jkps.66.465

DO - 10.3938/jkps.66.465

M3 - Article

AN - SCOPUS:84923821836

VL - 66

SP - 465

EP - 469

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

SN - 0374-4884

IS - 3

ER -