Effect of blocking layer by chemically induced surface barrier formation on xerographic properties

Young Ik Seo, Dae Gun Kim, Young Do Kim, Bum Jin Lee, Kyu Hwan Lee

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

In organic photoconductors, an anodic oxide layer acts as a barrier that prevents charge leakage to the substrate. A great challenge is forming a barrier that will enhance the xerographic properties of organic photoconductors. Here we report on a method for forming a surface barrier that simply involves immersion in extremely dilute alkaline solution and flattening in boiling water. The barrier demonstrates greatly enhanced wettability and xerographic properties of dark decay, sensitivity and residual voltage of the organic photoconductor.

Original languageEnglish
Pages (from-to)889-892
Number of pages4
JournalScripta Materialia
Volume59
Issue number8
DOIs
StatePublished - 2008 Oct 1

Fingerprint

Photoconducting materials
photoconductors
Oxides
Boiling liquids
Wetting
flattening
wettability
boiling
submerging
leakage
Water
Electric potential
Substrates
oxides
sensitivity
electric potential
decay
water

Keywords

  • Anodic failure
  • Organic photoconductor
  • Surface barrier
  • Wettability
  • Xerographic property

Cite this

Seo, Young Ik ; Kim, Dae Gun ; Kim, Young Do ; Lee, Bum Jin ; Lee, Kyu Hwan. / Effect of blocking layer by chemically induced surface barrier formation on xerographic properties. In: Scripta Materialia. 2008 ; Vol. 59, No. 8. pp. 889-892.
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Effect of blocking layer by chemically induced surface barrier formation on xerographic properties. / Seo, Young Ik; Kim, Dae Gun; Kim, Young Do; Lee, Bum Jin; Lee, Kyu Hwan.

In: Scripta Materialia, Vol. 59, No. 8, 01.10.2008, p. 889-892.

Research output: Contribution to journalArticle

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