E-H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas

Jung Kyu Lee, Hyo Chang Lee, Chin Wook Chung

Research output: Contribution to journalArticle

20 Scopus citations

Abstract

A study of the E-H mode transition was performed in Ar, O2, N2, and mixture gas inductively coupled plasma (ICP) from the measurement of the electron energy distribution function (EEDF). Changes of the EEDF and characteristics of the discharge on the E-H mode transition were discussed. At each E-mode, the measured EEDFs had different shapes depending on the gas type and pressure, while the EEDFs evolved into Maxwellian distribution with the E-H transition due to electron-electron collisions. This study was also focused on the transition ICP power when the discharge transits from E-mode to H-mode. As the ICP power increased in Ar discharge, the transition ICP power had minimum value at a particular pressure, while the transition ICP power was gradually increased with gas pressures in molecule gas discharge. The transition ICP power with gas mixing ratios was also studied in Ar/O2/N 2 mixture gas discharge.

Original languageEnglish
Pages (from-to)S149-S153
JournalCurrent Applied Physics
Volume11
Issue number5 SUPPL.
DOIs
StatePublished - 2011 Sep 1

Keywords

  • Capacitive mode
  • E-H mode transition
  • Electron energy distribution
  • Inductive mode
  • Inductively coupled plasma

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