Direct nanometer-scale patterning by the cantilever oscillation of an atomic force microscope

C. K. Hyon, S. C. Choi, S. W. Hwang, D. Ahn, Yong Kim, Eun Kyu Kim

Research output: Contribution to journalArticle

47 Scopus citations

Abstract

A resistless nanostructure patterning technique using tip oscillation of an atomic force microscope (AFM) was systematically investigated. Commercial AFM cantilevers are used to successfully generate patterns as narrow as 10 nm on a GaAs surface, without further sharpening of the tips. Reliable patterns with fully controlled width and depth are achieved by adjusting the feedback gain and the scan speed. This process allows nanometer-scale patterning to be performed simply, and is well suited for nanodevice fabrication.

Original languageEnglish
Pages (from-to)292-294
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number2
DOIs
StatePublished - 1999 Jul 12

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