Determination of the mechanism based deposition processes of thin film in OLED

Kwangki Lee, Kwang Soon Lee, Tae-Won Kim

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Abstract

Physical vapor deposition technique has been employed to develop a thin film of OLED, and atomic force microscopy was used to investigate the boundary characteristics such as uniformity of emitting layer, roughness, and surface morphology. In order to determine the deposition characteristic which associated with the materials failure in OLED, finite element simulation, together with alternative analytical modeling has been carried out by means of island growth mechanism analysis. The boundary growth of thin film can be determined from the velocity of island boundary using simple rate equations. The results obtained are compared with experimental observation. Generally good agreement has been achieved.

Original languageEnglish
Pages (from-to)1431-1434
Number of pages4
JournalKey Engineering Materials
Volume321-323 II
Publication statusPublished - 2006 Oct 12

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Keywords

  • Atomic Force Microscopy
  • Deposition Characteristics
  • OLED
  • Rate Equation

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