Control of the spatial distribution of ion flux in dual inductively coupled plasmas

Sung Won Cho, Jun Hyeon Moon, Aixian Zhang, Chin Wook Chung

Research output: Contribution to journalArticlepeer-review

Abstract

The effects of external discharge parameters (applied RF power, operating pressure, and gas flow rate) on ion flux uniformity are investigated in a dual inductively coupled plasma. The ion fluxes and electron temperatures are measured using a Langmuir probe floated by a DC blocking capacitor based on the floating harmonic method. The RF power applied to the top antenna focuses on the total ion flux control throughout the chamber, while the power introduced to the bottom antenna can control the ion flux uniformity in the diffusion chamber. At high pressures, the local electron heating in the vicinity of the bottom antennas results in local maximum ionization, thereby increasing the ion flux near the chamber wall. Furthermore, the ion flux uniformity also can be affected by the gas flow rate and pressure because they are associated with the gas residence time and the electron heating region. A physical understanding of the effects of external discharge parameters on plasma uniformity is useful for optimizing plasma processes.

Original languageEnglish
Article number103305
JournalJournal of Applied Physics
Volume129
Issue number10
DOIs
StatePublished - 2021 Mar 14

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