Computer-generated hologram etched in GaAs for optical interconnection of VLSI circuits

C. D. Carey, D. R. Selviah, S. K. Lee, S. H. Song, J. E. Midwinter

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


By integrating, on a wafer plane, GaAs semiconductor optoelectronic modulators and detectors with computergenerated holograms between then, the potential for in-plane interconnections is proposed. We report the fabrication and characterisation of a binary-phase relief hologram etched in a GaAs wafer using an averaged Fresnel zone plate design to focus light to 2 x 2 spots for array interconnection. Efficiencies of 28% for this design of binary CGH etched in GaAs have been achieved, close to the theoretical maximum.

Original languageEnglish
Pages (from-to)2082-2084
Number of pages3
JournalElectronics Letters
Issue number22
StatePublished - 1992 Oct


  • Computergenerated holograms
  • Optical interconnections
  • Semiconductor optoelectronics


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