Herein, the corrosion behaviors of W metal gates in the presence of H2O2 at the acidic medium were investigated as a function of dipping time, temperature, and H2O2 concentration. We determined the kinetic constants (i.e. kw and kh) based on the experimental data. The activation energy (Ea) are calculated from the Arrhenius equation. Thermodynamic parameters (ΔG‡, ΔH‡, and ΔS‡) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.