Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)

Byunguk Kim, Namgue Lee, Suhyeon Park, Taehun Park, Jaiwon Song, Seungwook Han, Hyunwoo Park, Dahyun Lee, Hohoon Kim, Hyeongtag Jeon

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Engineering & Materials Science

Chemical Compounds