Atomic layer deposition of GDC cathodic functional thin films for oxide ion incorporation enhancement

Hwichul Yang; Hojae Lee; Yonghyun Lim; Young Beom Kim

doi:10.1111/jace.17457

Atomic layer deposition of GDC cathodic functional thin films for oxide ion incorporation enhancement

Hwichul Yang, Hojae Lee, Yonghyun Lim, Young Beom Kim

DIVISION OF MECHANICAL ENGINEERING

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, we report successful fabrication of a gadolinia-doped ceria (GDC) thin film using atomic layer deposition (ALD) for improving the performance of solid oxide fuel cells (SOFCs). By varying the deposition conditions and adjusting the configuration of the ALD supercycle, the doping ratio of ALD GDC was controlled. The morphology, crystallinity, and chemical composition of ALD GDC thin films were analyzed. ALD GDC showed different surface chemistry, including oxidation states, at different doping ratios. The application of ALD GDC in a SOFC led to an output power density enhancement greater than 2.5 times. With an anodic aluminum oxide (AAO) porous support structure, an ALD GDC thin film SOFC (TF-SOFC) showed a high power density of 288.24 mW/cm² at an operating temperature of 450°C.

Original language	English
Pages (from-to)	86-95
Number of pages	10
Journal	Journal of the American Ceramic Society
Volume	104
Issue number	1
DOIs	https://doi.org/10.1111/jace.17457
State	Published - 2021 Jan

Keywords

Gadolinia-doped ceria
atomic layer deposition
functional interlayer
low-temperature solid oxide fuel cells
oxide ion incorporation

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10.1111/jace.17457

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title = "Atomic layer deposition of GDC cathodic functional thin films for oxide ion incorporation enhancement",

abstract = "In this paper, we report successful fabrication of a gadolinia-doped ceria (GDC) thin film using atomic layer deposition (ALD) for improving the performance of solid oxide fuel cells (SOFCs). By varying the deposition conditions and adjusting the configuration of the ALD supercycle, the doping ratio of ALD GDC was controlled. The morphology, crystallinity, and chemical composition of ALD GDC thin films were analyzed. ALD GDC showed different surface chemistry, including oxidation states, at different doping ratios. The application of ALD GDC in a SOFC led to an output power density enhancement greater than 2.5 times. With an anodic aluminum oxide (AAO) porous support structure, an ALD GDC thin film SOFC (TF-SOFC) showed a high power density of 288.24 mW/cm2 at an operating temperature of 450°C.",

keywords = "Gadolinia-doped ceria, atomic layer deposition, functional interlayer, low-temperature solid oxide fuel cells, oxide ion incorporation",

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T1 - Atomic layer deposition of GDC cathodic functional thin films for oxide ion incorporation enhancement

AU - Yang, Hwichul

AU - Lee, Hojae

AU - Lim, Yonghyun

AU - Kim, Young Beom

PY - 2021/1

Y1 - 2021/1

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AB - In this paper, we report successful fabrication of a gadolinia-doped ceria (GDC) thin film using atomic layer deposition (ALD) for improving the performance of solid oxide fuel cells (SOFCs). By varying the deposition conditions and adjusting the configuration of the ALD supercycle, the doping ratio of ALD GDC was controlled. The morphology, crystallinity, and chemical composition of ALD GDC thin films were analyzed. ALD GDC showed different surface chemistry, including oxidation states, at different doping ratios. The application of ALD GDC in a SOFC led to an output power density enhancement greater than 2.5 times. With an anodic aluminum oxide (AAO) porous support structure, an ALD GDC thin film SOFC (TF-SOFC) showed a high power density of 288.24 mW/cm2 at an operating temperature of 450°C.

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