Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications

Geon Ho Baek, Ji hoon Baek, Hye mi Kim, Seunghwan Lee, Yusung Jin, Hyung Soon Park, Deok Sin Kil, Sangho Kim, Yongjoo Park, Jin Seong Park

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Atomic layer chemical vapor deposition of SiO<sub>2</sub> thin films using a chlorine-free silicon precursor for 3D NAND applications'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds