Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant

Hye Mi Kim, Jung Hoon Lee, Seung Hwan Lee, Ryosuke Harada, Toshiyuki Shigetomi, Seungjoon Lee, Tomohiro Tsugawa, Bonggeun Shong, Jin Seong Park

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H<sub>2</sub>O as a Reactant'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds