Anchoring competition on nanosurface boundaries with conflicting mixed nematic anchoring properties

Jin Seog Gwag, Young Ki Kim, You Jin Lee, Ji Ho Baek, Jae Hoon Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We propose a technique for continuously controlling the full range of pretilt angles with a high process margin. The proposed method is characterized by tuning the thickness of a heterogeneous polyimide layer that consists of homeotropic and planar polyimides. The thickness of the mixture can be controlled by varying the concentration of the solvent. The liquid crystal (LC) pretilt generated at the very thin mixture film is insensitive to some incorrect mixing ratio, since the segregation of the depth direction of the mixture including the van der Waals effect in interactions with LCs decreases ultimately. Consequently, we can obtain continuous LC pretilt angles with a high process margin by controlling mixing ratio in a very thin heterogeneous polyimide film. Furthermore, it is possible to achieve excellent reliability, uniformity, and productivity using this technique. A simple mathematical model based on van der Waals interaction provides a good description of the experimental results.

Original languageEnglish
Article number034102
JournalJapanese Journal of Applied Physics
Volume51
Issue number3 PART 1
DOIs
StatePublished - 2012 Mar 1

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polyimides
Polyimides
mixing ratios
Liquid crystals
margins
liquid crystals
productivity
mathematical models
Tuning
Productivity
tuning
interactions
Mathematical models

Cite this

Gwag, Jin Seog ; Kim, Young Ki ; Lee, You Jin ; Baek, Ji Ho ; Kim, Jae Hoon. / Anchoring competition on nanosurface boundaries with conflicting mixed nematic anchoring properties. In: Japanese Journal of Applied Physics. 2012 ; Vol. 51, No. 3 PART 1.
@article{3af802aaf8694f378074a2f60dbe3c08,
title = "Anchoring competition on nanosurface boundaries with conflicting mixed nematic anchoring properties",
abstract = "We propose a technique for continuously controlling the full range of pretilt angles with a high process margin. The proposed method is characterized by tuning the thickness of a heterogeneous polyimide layer that consists of homeotropic and planar polyimides. The thickness of the mixture can be controlled by varying the concentration of the solvent. The liquid crystal (LC) pretilt generated at the very thin mixture film is insensitive to some incorrect mixing ratio, since the segregation of the depth direction of the mixture including the van der Waals effect in interactions with LCs decreases ultimately. Consequently, we can obtain continuous LC pretilt angles with a high process margin by controlling mixing ratio in a very thin heterogeneous polyimide film. Furthermore, it is possible to achieve excellent reliability, uniformity, and productivity using this technique. A simple mathematical model based on van der Waals interaction provides a good description of the experimental results.",
author = "Gwag, {Jin Seog} and Kim, {Young Ki} and Lee, {You Jin} and Baek, {Ji Ho} and Kim, {Jae Hoon}",
year = "2012",
month = "3",
day = "1",
doi = "10.1143/JJAP.51.034102",
language = "English",
volume = "51",
journal = "Japanese journal of applied physics",
issn = "0021-4922",
number = "3 PART 1",

}

Anchoring competition on nanosurface boundaries with conflicting mixed nematic anchoring properties. / Gwag, Jin Seog; Kim, Young Ki; Lee, You Jin; Baek, Ji Ho; Kim, Jae Hoon.

In: Japanese Journal of Applied Physics, Vol. 51, No. 3 PART 1, 034102, 01.03.2012.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Anchoring competition on nanosurface boundaries with conflicting mixed nematic anchoring properties

AU - Gwag, Jin Seog

AU - Kim, Young Ki

AU - Lee, You Jin

AU - Baek, Ji Ho

AU - Kim, Jae Hoon

PY - 2012/3/1

Y1 - 2012/3/1

N2 - We propose a technique for continuously controlling the full range of pretilt angles with a high process margin. The proposed method is characterized by tuning the thickness of a heterogeneous polyimide layer that consists of homeotropic and planar polyimides. The thickness of the mixture can be controlled by varying the concentration of the solvent. The liquid crystal (LC) pretilt generated at the very thin mixture film is insensitive to some incorrect mixing ratio, since the segregation of the depth direction of the mixture including the van der Waals effect in interactions with LCs decreases ultimately. Consequently, we can obtain continuous LC pretilt angles with a high process margin by controlling mixing ratio in a very thin heterogeneous polyimide film. Furthermore, it is possible to achieve excellent reliability, uniformity, and productivity using this technique. A simple mathematical model based on van der Waals interaction provides a good description of the experimental results.

AB - We propose a technique for continuously controlling the full range of pretilt angles with a high process margin. The proposed method is characterized by tuning the thickness of a heterogeneous polyimide layer that consists of homeotropic and planar polyimides. The thickness of the mixture can be controlled by varying the concentration of the solvent. The liquid crystal (LC) pretilt generated at the very thin mixture film is insensitive to some incorrect mixing ratio, since the segregation of the depth direction of the mixture including the van der Waals effect in interactions with LCs decreases ultimately. Consequently, we can obtain continuous LC pretilt angles with a high process margin by controlling mixing ratio in a very thin heterogeneous polyimide film. Furthermore, it is possible to achieve excellent reliability, uniformity, and productivity using this technique. A simple mathematical model based on van der Waals interaction provides a good description of the experimental results.

UR - http://www.scopus.com/inward/record.url?scp=84863274621&partnerID=8YFLogxK

U2 - 10.1143/JJAP.51.034102

DO - 10.1143/JJAP.51.034102

M3 - Article

AN - SCOPUS:84863274621

VL - 51

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

SN - 0021-4922

IS - 3 PART 1

M1 - 034102

ER -