A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas

Yeong Min Lim, Hyundong Eo, Kyung Hyun Kim, Moo Young Lee, Chin Wook Chung

Research output: Contribution to journalArticlepeer-review

Abstract

A wafer-type monitoring apparatus that can simultaneously measure the two-dimensional (2D) distributions of substrate temperature and plasma parameters is developed. To measure the temperature of the substrate, a platinum resistance temperature detector is used. The plasma density and electron temperature are obtained using the floating harmonics method, and incoming heat fluxes from the plasma to the substrate are obtained from the plasma density and electron temperature. In this paper, 2D distributions of the substrate temperature, plasma density, and electron temperature are obtained simultaneously for the first time in inductively coupled plasma. The shapes of the 2D distributions of the substrate temperature and incoming heat flux are similar to each other, but some differences are found. To understand that, an energy balance equation for the substrate is established, which shows good agreement with the experimental results. This apparatus will promote the understanding of surface reactions, which are very sensitive to the temperatures and plasma densities in plasma processing.

Original languageEnglish
Article number053531
JournalReview of Scientific Instruments
Volume92
Issue number5
DOIs
StatePublished - 2021 May 1

Fingerprint

Dive into the research topics of 'A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas'. Together they form a unique fingerprint.

Cite this